Description
The Global Antico HCl Purification System is a multi-stage purification plant engineered to upgrade commercially available or process-produced hydrochloric acid to semiconductor, pharmaceutical, or electronic chemical grade — meeting demanding specifications such as SEMI C30 (Tier 1–4), USP, or EP standards. Crude HCl acid typically contains trace organic impurities, dissolved metal contaminants (Fe, Cr, Ni, Pb, etc.), particulates, and colour bodies that render it unsuitable for high-specification applications. The purification train deploys a combination of stripping/re-absorption (to remove dissolved gases and volatile organics), activated carbon adsorption (for non-volatile organics and colour removal), and ion exchange polishing (for ppb-level heavy metal reduction).
In the stripping stage, crude acid is heated under controlled conditions in a PTFE/PFA-lined stripper column, releasing dissolved HCl gas which is re-absorbed in ultra-pure water in a separate absorption column — producing purified HCl at target concentration. This re-absorption step physically separates the HCl from non-volatile impurities. The ion exchange polishing stage uses high-purity chelating resin beds to reduce metal ion concentrations to sub-ppb levels. All wetted pathway components — vessels, columns, piping, pumps, and instruments — are constructed from PTFE, PFA, or high-purity polypropylene. Inline ICP-OES compatible sampling points allow real-time trace metal verification. Modular capacity designs from 500 L/hr to 10,000 L/hr, with clean-room compatible skid packaging available for semiconductor fab integration.
Key Features
- Stripping and re-absorption column for volatile organic removal
- Activated carbon adsorption for non-volatile organics and colour
- Ion exchange chelating resin polishing for ppb metal removal
- All-PTFE/PFA wetted pathway — zero metallic contamination
- Inline ICP-OES compatible trace metal sampling points
- Closed-loop acid handling and N₂-blanketed product storage
- Clean-room compatible skid packaging for fab integration
- Automated CIP (clean-in-place) system for resin regeneration
- Batch quality release documentation for GMP compliance
- Online conductivity and concentration monitoring
Technical Specifications
| Output Purity Grade | Semiconductor / Pharma / Electronic |
| Heavy Metals | <1 ppb achievable (ICP-MS) |
| Organic Removal | >99.9% organic removal |
| Capacity | 500 L/hr – 10,000 L/hr |
| Wetted Materials | PTFE / PFA / High-Purity PP |
| Standards Met | SEMI C30 / USP / EP |
| Closed-Loop | Yes — N₂ blanketed throughout |
| Monitoring | Inline trace metal + conductivity |
Industrial Applications
- Semiconductor wafer cleaning and etching (SEMI C30 grade)
- Pharmaceutical GMP acid for synthesis and pH adjustment (USP/EP)
- Electronic chemicals for PCB manufacturing
- Solar cell and photovoltaic wafer manufacturing
- Analytical and laboratory reagent grade production
- High-purity chemical synthesis requiring metal-free acid
If you need process solution... We are available for you
Submit your reaction parameters, operating pressure, temperature range, and material compatibility requirements. Our engineering team will recommend the appropriate configuration.

